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Photochemical attachment of polymers on planar surfaces with a covalently anchored monolayer of a novel naphthyl ketone photochemical radical generator
Published in
2004
Volume: 42
   
Issue: 21
Pages: 5413 - 5423
Abstract
A monolayer of covalently anchored, novel, binaphthyl ketone is used as a surface-confined photochemical radical generator (PRG) for anchoring a variety of polymers to silicon surfaces, The precursor FRG is synthesized by the application of a facile and novel method for the oxidation of statically hindered benzylic hydrocarbons to carbonyl compounds. Oxidation was carried out with a stoichiometric amount of potassium peroxydisulfate, in the presence of a catalytic amount of copper sulfate in an acetonitrile/water mixture. The PRO synthesized is characterized by 1H NMR, UV, and Fourier transform infrared (FTIR). The covalently attached monolayers are characterized by X-ray photoelectron spectroscopy, ellipsometry, and water contact angle measurements. The method developed is applicable to the preparation of a monolayer of a variety of polymers on a wide range of substrates carrying surface hydroxyl groups. © 2004 Wiley Periodicals, Inc.
About the journal
JournalJournal of Polymer Science, Part A: Polymer Chemistry
ISSN0887624X
Open AccessNo
Concepts (17)
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    Fast fourier transforms
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    Fluorescence
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    Hydrocarbons
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    Ketones
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    Monolayers
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    Oxidation
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    Photochemical reactions
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    Silicon
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    Surface treatment
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    X ray photoelectron spectroscopy
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    BINAPHTHYL KETONES
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    COVALENTLY ANCHORED INITIATOR MONOLAYERS
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    Fluorescence imaging
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    PHOTOCHEMICAL ATTACHMENT
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    PHOTOINITIATORS
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    POLYMER MONOLAYERS
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    Polymers