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67 Publications
26 Journals
Srinivasan Ramanathan
Professor
Department Of Chemical Engineering
srinivar@iitm.ac.in (Work)
+91-44 2257 4171 (Work)
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Publications - 67
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Publications (67)
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Publications (67)
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Conferences
Analysis of copper dissolution in glutamic acid and hydrogen peroxide using EIS
Srinivasan Ramanathan
2011
Articles
Experimental and theoretical investigation on microwave melting of metals
Sekaran Chandrasekaran
,
Tanmay Basak
and
Srinivasan Ramanathan
2011
Articles
An analysis of drifts and nonlinearities in electrochemical impedance spectra
Srinivasan Ramanathan
and
Niket S. Kaisare
2011
Articles
Electrochemical characterization of Cu dissolution and chemical mechanical polishing in ammonium hydroxide-hydrogen peroxide based slurries
Srinivasan Ramanathan
2010
Conferences
Mechanism of high selectivity in ceria based shallow trench isolation chemical mechanical polishing slurries
Srinivasan Ramanathan
2010
Articles
Open Access
Potassium bromate as an oxidizing agent in a titania-based Ru CMP slurry
Srinivasan Ramanathan
2010
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Conferences
Electrochemical impedance spectroscopic studies of copper dissolution in glycine-hydrogen peroxide solutions
Srinivasan Ramanathan
2010
Articles
Open Access
Identification of reaction mechanism for anodic dissolution of metals using Electrochemical Impedance Spectroscopy
Srinivasan Ramanathan
2010 | Elsevier
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Conferences
High selectivity slurries for STI CMP
Srinivasan Ramanathan
2010
Articles
The effect of hydrogen peroxide on polishing removal rate in CMP with various abrasives
Srinivasan Ramanathan
2009 | Elsevier
Articles
Open Access
Electrochemical impedance spectroscopic studies of copper dissolution in arginine-hydrogen peroxide solutions
Srinivasan Ramanathan
2009
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Conferences
EIS studies of copper dissolution in arginine-peroxide slurries
Srinivasan Ramanathan
2008
Articles
Open Access
Role of abrasives in high selectivity STI CMP slurries
Srinivasan Ramanathan
2008
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Articles
Facile synthesis of palladium nanoclusters and their catalytic activity in Sonogashira coupling reactions
Jeyaraman Athilakshmi
,
Srinivasan Ramanathan
and
Dillip Kumar Chand
2008
Articles
Chemical mechanical planarization of copper in alkaline slurry with uric acid as inhibitor
Srinivasan Ramanathan
2007
Other
Insitu characterization of Cu CMP with peroxide based slurries containing arginine as complexing agent
Srinivasan Ramanathan
and
Nagendra Prasad Y.
2007 | VDE Verlag GmbH
Conferences
Particle science and technology education and research at IIT madras: A synergistic approach
Ramamurthy Nagarajan
and
Srinivasan Ramanathan
2006
Conferences
The Role of Arginine as a Complexing Agent in Copper CMP
Srinivasan Ramanathan
and
Sekhar Moganty Surya
2006 | Cambridge University Press (CUP)
Conferences
Characterization of copper chemical mechanical polishing (CMP) in nitric acid-hydrazine based slurry for microelectronic fabrication
Moganty Surya Sekhar
and
Srinivasan Ramanathan
2006
Articles
Open Access
Role of amino-acid adsorption on silica and silicon nitride surfaces during STI CMP
Srinivasan Ramanathan
2006
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