Electrical transport in Gold/porous silicon/crystalline silicon junctions has been studied. The junctions are found to improve when the porous silicon is exposed to a hydrogen plasma before depositing the top metal. The hydrogen passivated junctions exhibited higher current levels and emitted light at lower voltages as compared to the unhydrogenated ones. Internal photoemission measurements were carried out to investigate the gold/porous silicon barrier. The barrier height determined from the Fowler plot is independent of the top material. The temperature dependence of the barrier height is similar to that of the crystalline silicon energy gap.