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Nanomechanical and microstructural characterization of sputter deposited ZnO thin films
Published in Elsevier B.V.
2016
Volume: 389
   
Pages: 1023 - 1032
Abstract
The nano-mechanical properties of ZnO thin films deposited at different substrate temperature such as (RT) 25 °C, 100 °C, 200 °C, and 300 °C using DC-sputtering on Corning glass substrate were investigated. The ZnO thin films are found to be predominately c-axis (002) oriented. The crystal structure is sensitive to increasing substrate temperature and new set of crystal planes become visible at 300 °C as thin films become highly polycrystalline. The presence of (103) crystal plane is more pronounced with the increasing substrate temperature. However, high crystallinity and peak intensity ratio I (002) /I (103) (counts) is highest for thin films deposited at 100 °C, which is attributed for high hardness and better adhesive properties observed for ZnO thin films. Concomitantly, no major sudden burst of displacement ‘pop-in’ event in load-displacement curve of thin films observed during indentation, indicating the films are dense with low defects and adhered strongly to the substrate. © 2016 Elsevier B.V.
About the journal
JournalData powered by TypesetApplied Surface Science
PublisherData powered by TypesetElsevier B.V.
ISSN01694332
Open AccessNo
Concepts (17)
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    Crystal structure
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    Ii-vi semiconductors
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    Metallic films
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    Microstructure
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    Nanoindentation
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    Optical films
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    Substrates
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    Zinc oxide
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    Adhesive properties
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    Different substrates
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    LOAD-DISPLACEMENT CURVE
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    Micro-structural characterization
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    NANOMECHANICAL PROPERTY
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    PEAK INTENSITY RATIO
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    Strength
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    Substrate temperature
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    Thin films