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Nanofabrication of large area gratings using electron beam lithography in normal and fixed beam moving stage mode
Published in OSA - The Optical Society
2014
Abstract
A large area sub-micron period grating by a moving electron beam results in stitching error. It is corrected in the fixed beam moving stage mode, while allowing a minimal compromise between the writing time and the line quality. © OSA 2016.
About the journal
JournalData powered by TypesetOptics InfoBase Conference Papers
PublisherData powered by TypesetOSA - The Optical Society
ISSN1084-7529
Impact Factor1.230
Open AccessNo
Citation Styleunsrt
Sherpa RoMEO Archiving PolicyGreen
Concepts (8)
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    Electron beam lithography
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    Electron beams
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    Fixed beam
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    LINE QUALITY
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    MOVING STAGES
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    STITCHING ERRORS
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    SUB MICRON
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    Photonics