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Formation of highly porous electrochemically etched silicon carbide: A novel reusable adsorbent for air purification technology
Jaganathan Senthilnathan
Published in Elsevier Ltd
2019
Volume: 218
   
Pages: 521 - 528
Abstract
In this study, carbon-rich mesoporous silicon carbide (CRP-SiC: thickness of 1.3 μm and surface area of 77.3 m 2 /g) was obtained by electrochemical etching of polycrystalline SiC using HF/acetonitrile (1:5.6 ratio) at an optimum current density of 30 mA/cm 2 . The selective etching of Si from SiC was validated by Raman and X-ray diffraction analyses. High resolution-transmission electron microscope and atomic force microscope analysis showed the mesoporous structure (range: 10–100 nm) and a valley-and-peak form on the surface of CRP-SiC, respectively. The potential utility of CRP-SiC as an ideal adsorbent for commercial application was investigated against the low-molecular aliphatic volatile organic compounds (VOCs) like glutaraldehyde (GA) and formaldehyde (FA) as model target compounds. The maximum specific adsorption capacity of CRP-SiC, when measured for the GA and FA at the initial concentration 30 ppm, were 89.1 and 79.2 mg/g, respectively. The total adsorption capacity of this adsorbent was above 90%, when reused up to five times. The adsorption performance of CRP-SiC was also remarkably high in terms of partition coefficient relative to many other types of common sorbents (e.g., powder or granular activated carbon). The potential of carbon-rich surface on a stable and hard SiC semiconducting material is investigated in depth to help find the better alternative for the conventional or other well recognized adsorbent for treating VOCs. © 2019 Elsevier Ltd
About the journal
JournalData powered by TypesetJournal of Cleaner Production
PublisherData powered by TypesetElsevier Ltd
ISSN09596526
Open AccessNo
Concepts (22)
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    Activated carbon
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    Adsorption
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    Air cleaners
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    Atomic force microscopy
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    Computer software reusability
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    Crystal atomic structure
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    Electrochemical etching
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    Formaldehyde
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    Porous silicon
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    Silicon carbide
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    Volatile organic compounds
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    Wide band gap semiconductors
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    X ray diffraction analysis
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    ADSORPTION PERFORMANCE
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    CARBON RICH
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    Commercial applications
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    GLUTARALDEHYDES
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    GRANULAR ACTIVATED CARBONS
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    Initial concentration
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    SEMICONDUCTING MATERIALS
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    SPECIFIC ADSORPTION CAPACITIES
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    Coefficient of performance