The authors regret <that the nanoscale silica support used in this work is fumed silica (f-SiO2) while in the original article it is inadvertently written as colloidal silica (c-SiO2) in the entire text, figures and tables. This correction, however, does not affect the results and conclusions of the article but, at the same time, it is important to note that the characteristics of these two materials are quite different form each other.> The authors would like to apologise for any inconvenience caused. Declaration of Competing Interest. The authors report no declarations of interest. © 2020 Elsevier B.V.