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Electroless plated nickel contacts to hydrogenated amorphous silicon
T. Balaji, S. Satish Kumar, ,
Published in
1994
Volume: 252
   
Issue: 2
Pages: 78 - 81
Abstract
We report for the first time investigations on electroless plated-nickel phosphorus alloy (Ni) contacts to undoped amorphous silicon (a-Si:H). I-V characteristics of electroless NiP were compared with those of Nickel deposited by thermal evaporation. It was found that as-deposited NiP makes a rectifying contact to undoped a-Si:H. The effects of plasma annealing on the contacts were studied. NiP contacts on low pressure chemical vapour deposited a-Si are also reported here. © 1994.
About the journal
JournalThin Solid Films
ISSN00406090
Open AccessNo
Concepts (16)
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    Amorphous materials
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    Annealing
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    Chemical vapor deposition
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    Crystalline materials
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    Electrons
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    Electroplating
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    Evaporation
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    Nickel alloys
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    Plasma applications
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    Silicon
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    ELECTROLESS PLATED NICKEL CONTACTS
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    Hydrogenated amorphous silicon
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    PLASMA ANNEALING
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    PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION
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    Thermal evaporation
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    Ohmic contacts