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Contact angle measurements on polysilicon for surface micromachining applications
, U. Venu Babu, L. Helen Anitha Rani, , P. R.S. Rao
Published in
2002
Volume: 5062
   
Issue: 1
Pages: 367 - 372
Abstract
Polysilicon layers deposited by Low Pressure Chemical Vapour Deposition (LPCVD) on sacrificial oxides are used for surface micromachined structures. Stiction is a major problem in surface micromachining both during processing and in use. Contact angle measurements on surfaces can give indication on the adhesivity of the surface. In this paper, contact angle measurements on polysilicon surface after different treatments are reported with a view to understand their stiction behaviour. We also report on surface roughness measurements on these samples.
About the journal
JournalProceedings of SPIE - The International Society for Optical Engineering
ISSN0277786X
Open AccessNo
Concepts (13)
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    Adhesion
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    Chemical vapor deposition
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    Contact angle
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    Doping (additives)
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    Interfacial energy
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    Micromachining
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    Oxides
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    Pressure effects
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    Stiction
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    Surface roughness
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    LOW PRESSURE CHEMICAL VAPOUR DEPOSITION
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    SURFACE PROFILER
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    Polysilicon